Chief Researcher, National Institute for Materials Science (NIMS)
Electron field emission from self-organized micro emitters of new-type boron nitride films
Negative electron affinity (NEA) and geometrical enhancement factor are distinctly important to promote electron field emission (eFE), and it must be possible to control them in the fabrication of electron emitting devices. NEA occurs in semiconductors when the vacuum level lies below the conduction band minimum mainly due to a surface electronic dipole, which is known for doped diamond surfaces terminated with hydrogen. Wide band gap materials such as diamond, AlN, and BN are empirically known to show NEA. The geometrical enhancement factor β is defined as a constant characteristic of an electron field emitter in the Fowler-Nordheim equation. It is related to the local electric field enhancement caused by protruded shapes, which is prominent in carbon nanotubes (CNT) and fabricated electron field emitters employing shapes with high aspect ratio.
Here, we report on self-organized electron emitters with high β, cone-shape structures and micrometer dimensions made of sp3-bonded 5H-BN. Emission density (Id) generation began at 90 mA/cm2 with a threshold of 6 V/μm, which is comparable to that of CNT, and the Id rapidly reached ~0.9 A/cm2 with an applied electric field (E) of 8.6 V/μm. This value of Id was very high considering the low applied E in comparison with those of CNT. The films were grown by plasma-assisted chemical vapor deposition with the assistance of 193 nm laser irradiation of the surface. The work function of this material was ~5 eV while the band gap was estimated to be ~6 eV. The known robustness of sp3-bonded BN with its excellent electron emission characteristics and the self-organization of the emitter shaped structures may provide new applications for electron emitting devices.



