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SubjectPhotomask Technology + Extreme Ultraviolet Lithography 2021
Start Date2021/09/26 17:00
End Date2021/10/01 17:00
LocationMonterey Conference Center, Monterey, California, USA
Contacthelp(at)spie.org
Detail TOPICS: 
 Photomask Technology
-Design automation and data prep (DFM, OPC, SMO)
-Mask write, corrections, process compensation (MPC)
-Mask blanks, defects, and metrology (materials, process, control)
-Mask process (resist, develop, etch, cleans)
-Metrology (CD, placement, AFM, AIMS)
-Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
-Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
-Nanoimprint lithography tools, mask, transfer, and resists
-Deep learning mask technology applications

 Extreme Ultraviolet Lithography
-EUV readiness and insertion in manufacturing
-EUV tools, including sources and optics
-EUV mask metrology, inspection, and lifetime
-EUV mask and imaging
-EUV mask pellicles
-EUV resist materials/process and contamination
-EUV process control and stochastics
-EUV patterning and process enhancement
-EUV lithography extendibility

Organizer : 
SPIE

Manuscripts Due Date :
 25, August 2021

Please go to the following URL for more information.
URL :  https://spie.org/conferences-and-exhibitions/photomask-technology--extreme-ultraviolet-lithography?SSO=1