【公開日：2025.06.10】【最終更新日：2025.04.06】
課題データ / Project Data
課題番号 / Project Issue Number
24NM5243
利用課題名 / Title
表面量子相物質に関する研究
利用した実施機関 / Support Institute
物質・材料研究機構 / NIMS
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）計測・分析/Advanced Characterization（副 / Sub）加工・デバイスプロセス/Nanofabrication
【重要技術領域 / Important Technology Area】（主 / Main）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions（副 / Sub）高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed
キーワード / Keywords
原子薄膜/ Atomic thin film,量子効果/ Quantum effect,表面・界面・粒界制御/ Surface/interface/grain boundary control,超伝導/ Superconductivity,スパッタリング/ Sputtering
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
内橋 隆
所属名 / Affiliation
物質・材料研究機構
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
QIAN Wenxuan
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
Akihiko Ohi
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）,技術補助/Technical Assistance
利用した主な設備 / Equipment Used in This Project
NM-511：FIB加工装置（JEM-9320FIB）
NM-647：FE-SEM+EDX [S-4800]
NM-664：スパッタ装置 [CFS-4EP-LL #4]
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
Low dimensional superconductors have attracted attentions from related fields for their unique properties. But the experiments for low dimensional superconductors must be carried out in ultrahigh vacuum (UHV) at low temperatures, the fabrication of electrodes for transport measurements remains to be a problem. Here we use the combination of FIB and SEM to fabricate shadow mask for nano-stenciling and characterize the electrode pattern we make. To ensure the conductivity between sample holder and sample film, we used sputtering system to evaporate a thin layer of Ta onto the end of silicon substrate. The technology to fabricate tiny and complicate electrode pattern may give us possibilities to fabricate new generation of sensitive devices.
実験 / Experimental
We used FIB to mill the shadow mask made by stainless steal film. With the FIB system, we can make patterns at micrometer order and confirm the pattern at the site. We confirmed that until 10 micrometer, the mask we made by FIB is well-functioning.We also use SEM to check the nano-stenciled samples. Since we use the non-doped silicon as our substrate, there is a accumulation of charge and will cause charge effect to some extent. we use low accelerating voltage to operate SEM at 1.7 kV. We can observe the mask pattern clearly with the help of SEM.For the Hall measurement at low temperature. the conductivity between sample holder and substrate is limited. We used the sputtering evaporation to evaporate 100 nm Ta film at the end of silicon bar to ensure the conductivity. By this method, we measured the Hall resistance of a Bi film at the lowest temperature of 400mK.
結果と考察 / Results and Discussion
We have already found some peculiar transport behavior with tiny conductive channel on masked samples. Based on the testification we have done, we are now considering to further reduce the scale of electrode to conduct electron transport measurements at micro/nano scale to study the vortex related physics phenomena on the surface of atomically thin film. We have also measured the Hall resistance of a Bi film with magnetic field up to 9T in the vacuum at about 400 mK. We are looking forward to apply our research technology to our further study on new devices.
図・表・数式 / Figures, Tables and Equations
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
- The 10th International Symposium on Surface Science, Oct. 20-24, 2024, Kita-Kyusyu, Japan
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件