【公開日：2025.06.10】【最終更新日：2025.05.21】
課題データ / Project Data
課題番号 / Project Issue Number
24UT0238
利用課題名 / Title
Fabrication of SVC optical device
利用した実施機関 / Support Institute
東京大学 / Tokyo Univ.
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）計測・分析/Advanced Characterization（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions（副 / Sub）-
キーワード / Keywords
strong vibration coupling, polaritonic chemistry, excitonic energy transfer,量子効果/ Quantum effect,エリプソメトリ/ Ellipsometry,フォトニクス/ Photonics
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
董 俊余
所属名 / Affiliation
東京大学大学院理学系研究科化学専攻
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）,技術補助/Technical Assistance
利用した主な設備 / Equipment Used in This Project
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
Our research topics are mainly focused on energy transfer processes in molecular systems under optical cavity coupling. Specifically, we would like to utilize the coupling of the photonic states in the optical cavity with the vibrational modes of the molecules to modulate the nature of exciton energy transfer in molecular aggregates. In this process, an optical cavity with a high quality factor is necessary in order to realize the coupling. In order to optimize the design of the optical cavity, modulation of the thickness of the metal film on the reflector is an indispensable step. Therefore, we apply the use of ARIM's ellipsometer M-2000DI-T to determine different material deposition rates for different magnetron sputtering instruments. In addition, for the molecular system, we would also like to use this instrument to determine the thickness of the polymer molecular layer under different spin-coating parameters, in order to have a better control of the conditions for the experiments.
実験 / Experimental
We mainly utilize the ellipsometer(M-2000U) to measure film thickness. In the previous year, our experiments mainly consisted of:
1. Determination of the deposition rate of Au and Ag on silicon substrate by the vacuum magnetron sputtering apparatus of Goda Lab.
2. Determination of the deposition rate of Au, Cr, Al2O3, and SiO2 films in Takeda CR's Sputter SHIBAURA CFS-4EP-LL 2024.
3. Determination of polymer film thickness under different spin-coating conditions
結果と考察 / Results and Discussion
After our measurements, we obtained the following results:
1. Magnetron sputtering instrument in Goda Lab: gold deposition rate is about 0.509 nm/s, silver deposition rate is about 0.303 nm/s.
2. Sputter SHIBAURA CFS-4EP-LL 2024 in Takeda CR: Au deposition rate was 0.383 nm/s (RF power: 200W), Cr deposition rate was 0.145 nm/s (RF power: 200W), and Al2O3 deposition rate was 0.0701 nm/s (RF power: 400W).
3. The relationship between PMMA and PVA film thicknesses and spin-coating parameters was also determined.Overall, the ellipsometer M-2000U helped us well in determining the thickness of various films and contributed to the overall advancement of the research.
図・表・数式 / Figures, Tables and Equations
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件